Double patterning is a class of technologies developed for photolithography to enhance the feature density of computer chips. The resolution of a photoresist pattern begins to blur at around 45 nm ...
Foundries are finally in production with EUV lithography at 7nm, but chip customers must now decide whether to implement their next designs using EUV-based multiple patterning at 5nm/3nm or wait for a ...
Self-aligned lithographic process techniques are playing an increasingly important role in advanced technology nodes. Even with the growing use of extreme ultraviolet (EUV) lithography, ...
The SPIE Advanced Lithography + Patterning Symposium has been the showcase of the latest advances in lithography and patterning technology for over four decades. The technology landscape keeps on ...
Major Milestone Passed with Photonic Crystal Patterning on Full 4-inch Wafers with PHABLE Technology
Novel lithography approach offers photonic crystal patterns with a 600 nm period. Villigen, Switzerland, January 27, 2010 - Today, Eulitha AG of Switzerland and Dai Nippon Printing Co., Ltd. (DNP) of ...
Researchers have developed a one-step, facile method to pattern graphene by using stencil mask and oxygen plasma reactive-ion etching, and subsequent polymer-free direct transfer to flexible ...
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