Nonthermal and thermal plasmas are used in the industrial, engineering, medical, and research industries. Plasma composition is an important parameter in any plasma process. Using optical emission ...
Plasma etching and atomic layer etching (ALE) constitute essential techniques in the fabrication of next‐generation nanoscale devices. Plasma etching utilises ionised gases to selectively remove ...
“Plasma” refers to a gas with a significant proportion of ionized molecules, which produce various excited ions, atoms, and molecules. Electrons liberated from ions and atoms are highly energetic and ...
Plasma chemistry and etching processes form the backbone of modern semiconductor fabrication, enabling the precise patterning and removal of material layers essential to device performance. By ...
A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoS₂), a next-generation ...
To store ever more data in electronic devices of the same size, the manufacturing processes for these devices need to be studied in greater detail. By investigating new approaches to making digital ...
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Imagine trying to carve a tiny, complex sculpture into a block the size of your fingernail again and again, billions of times, with nearly no room for error. That’s ...
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